LightSmyth Technologies was founded in 2000 on the idea that DUV projection photolithography, traditionally used for electronic integrated circuits (EIC), may be applied to produce powerful optical devices based on diffractive effects. The fabrication technology, along with proprietary optical design and intimate knowledge of the processes and tolerances, is our key differentiator. LioghtSmyth is the only company that was able to successfully commercialize standard DUV fabrication tools from electronic industry for fabrication of free space diffraction gratings.
While waveguide-based lithographically fabricated devices are quite common, and e-beam lithography is known to be used for Bragg and free space gratings, DUV projection photolithography combines the best of the two approaches. Like waveguide-based optical devices and EIC, it allows optical devices be produced in large quantities with extremely high reproducibility and excellent fabrication yield, providing for superior performance, pricing and volume capabilities. And like e-beam lithography, DUV projection lithography allows for fabrication of arbitrary shaped sub-wavelength features in visible and IR regions, which enables utilization of powerful diffractive effects.
Since the year of 2000, LightSmyth Technologies produced extensive portfolio of patents and article addressing multiple aspects of design and fabrication of diffractive structures using DUV photolithography. While the initial development thrust was in integrated diffractives, over the last 10 years the Company’s efforts were concentrated in the field of free space optics and gratings.