Reflection gratings are used in a variety of optical applications requiring spatial separation of light by wavelength. LightSmyth’s ultra-low scatter reflection gratings are fabricated using projection lithography and reactive-ion-etch of single-crystal-silicon substrates. Gratings may be coated by a variety of metallic and dielectric materials and optimized for your application using our highly accurate coating simulation software and state-of-the-art coating facility. Groove depth and duty cycle are optimized to maximize first order diffraction achieving up to 95% peak absolute diffraction efficiency.
Each grating is a master, not a replica, resulting in low-scatter and long-lasting performance. Yet the volume fabrication process allow us to offer prices below that of common replicated gratings. The silicon substrate provide thermal conductivity approaching that of copper and thermal expansion lower than Pyrex making it an ideal general substrate material and in a class by itself in high temperature or power applications. Sub-millimeter substrate thicknesses make these gratings ultra-light and enable device miniaturization.
Importantly, LightSmyth reflection gratings reduce scattered light up to 100X compared to conventional commercial replicated holographic gratings and mechanically ruled gratings (see plot at right).
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Typical grating thickness is approximately 0.7 mm. Substrate height and width tolerance is ± 0.3 mm. Grating substrate: single crystal silicon. Grating coating: aluminum. Custom coatings optimized for your particular application are available as an option.
Ordering notes: the total order price will include handling and shipping charges. For orders with the total product value below $250.00, a handling fee of $75.00 will be added, otherwise the handling fee is $5.00. For shipping options and pricing, refer to the order form.
| Line Density
|λPE 1||Size||Part number||Price|
|1200||580 nm (s), 1 µm to 1.55 µm (p)||12.5 mm × 12.5 mm||SLG-C12-1212A-Al||$70.00 ea.|
|1200||580 nm (s), 1 µm to 1.55 µm (p)||25 mm × 25 mm||SLG-C12-2525A-Al||$116.00 ea.|
|1200||580 nm (s), 1 µm to 1.55 µm (p)||50 mm × 30 mm 2||SLG-C12-5030A-Al||$193.00 ea.|
|1800||390 nm (s), 660 nm to 1.0 µm (p)||20 mm × 9 mm 2||SLG-C18-2009A-Al||$70.00 ea.|
|2400||300 nm (s),430 nm to 780 nm(p)||12.5 mm × 12.5 mm||SLG-C24-1212A-Al||$70.00 ea.|
|3600||240 nm (s), 480 nm (p)||12.5 mm × 12.5 mm||SLG-C36-1212A-Al||$70.00 ea.|
|1 The peak efficiency wavelength, λPE, indicates wavelength(s) of highest efficiency at 1st diffractive order for a given polarization state (in parenthesis). S (P)-polarization: Incident electric field vector parallel (perpendicular) to grating lines. Values are given for Littrow mount.|
|2 Second dimension corresponds to the groove length.|
|3 For orders with the total product value below $250.00, a handling charge of $75.00 will be added, otherwise the handling fee is $5.00.|
Ultra-high line density gratings offered by LightSmyth enables very high efficiency and low scatter diffraction for X-ray and EUV wavelength regions. Gratings are suitable for in-plane and off-axis mounts. Typical grating thickness is approximately 0.73 mm. Substrate height and width tolerance is ± 0.3 mm. Grating substrate: single crystal silicon. Grating coating: gold with seed layer of chromium. Custom coatings optimized for your particular application are available as an option.
| Line Density
|Groove depth||Size||Part number||Price 1, 2|
|7200||50 nm||12.5 mm × 12.5 mm||SLG-C72-1212A-Au||$310.00 ea.|
|7200||50 nm||25 mm × 25 mm||SLG-C72-2525A-Au||$490.00 ea.|
|7200||50 nm||50 mm × 50 mm||SLG-C72-5050A-Au||call|
|1 For orders with the total product value below $250.00, a handling charge of $75.00 will be added.|
|2 The list price for gold-coated gratings does not include gold coating lot charge. The lot charge is $500 for up to 10 gratings.|
LightSmyth offers custom diffraction gratings with the following attributes:
Our optical engineers will gladly assist with your custom application.