LightSmyth Technologies - Crafting Light for Industry and Science

Products:

Diffraction Gratings:

Custom Gratings

Absolute design freedom

DUV photolithography provides an unprecedented flexibility in the shape of diffractive contours. The designers can now control placement of individual pixels as small as 70 x 70 nm. Absence of stitching error inherent to e-beam lithography ensures spatial coherence between the pixels within a field area of 25 x 32 mm. Grating arrays with precisely positioned reference gratings or multiple analytical gratings may be produced for advanced self-calibrating or ultra-wide-range spectroscopic systems. Diffraction gratings with arbitrary line curvature, variable line spacing and individual line control may be designed according to your specification. General binary diffraction structures or surface relief holograms may be also produced with high fidelity and in large volumes.

We can assist with finalizing your preliminary design concept or implement your already prepared CAD design files into hardware. Below we list examples of application areas utilizing the strength of the LightSmyth approach. Our staff of experienced scientists will be happy to discuss your particular application.

Monolithic Grating Arrays

DUV photolithography provides for high-precision positioning of multiple diffraction gratings on the same substrate with nanometer-scale accuracy. Each grating may have a different tilt providing convenient separation of output spectra using two-dimensional detector readout. Tilted reference gratings embedded with the analytical set of gratings provide for convenient, invariant of the input angle, on-detector wavelength calibration when used with a reference source.

Grating arrays may be arranged in stacked, interleaved or even overlain fashion.

Two or more gratings with different periods and line orientation
may be arranged to overlap the same grating area.
Aberration-corrected focusing grating on flat substrate provides for miniature spectrometers.

Curvilinear Gratings

DUV photolithography is the only practical technology for fabricating off-axis diffraction gratings, imaging diffraction gratings on flat substrates and other unusual and sophisticated diffraction grating components.

Binary Diffractive Structures and Holograms

Even the most complex binary diffraction structures and holograms may be easily designed and produced in large volume using our process. Complex contours may be truthfully reproduced using 1011 individual pixels programmable over the area of 25 x 32 mm.