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In the News

articles-sidebarImpact of high-resolution photolithography on integrated photonics
T.W. Mossberg, D. Iazikov, C.M. Greiner, Microlithography World, Vol. 14, #3, August/September 2005
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Submicron-resolution laser maskwriters combined with reduction photolithography provide the means to produce powerful new kinds of integrated and free-space optical devices. These photonic devices employ diffraction from features on the scale of 50-250nm and with interferometrically accurate placement throughout the photolithographic field.


Submicron Photolithography Opens New Areas of Holographic Design
Thomas Mossberg, Christoph Greiner and Dmitri Iazikov, Laser Focus World, October 2004, pp. 73 – 76
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Enabled by advances in deep-ultraviolet photolithography and computer-based holographic design, a new family of transport devices is emerging. The use of volume-holographic structures within a planar waveguide is being called integrated holographics.


Holographic Bragg Reflectors, Photonic Bandgaps and Photonic Integrated Circuits
T. W. Mossberg, C. M. Greiner and D. Iazikov, Optics & Photonics News, Vol.15, No. 5, pp 26-33 (2004)
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Significant opportunities can arise abruptly from unexpected discoveries or flow gradually from the integration of a series of evolutionary advances; in the second case, it may be only the perception of opportunity that develops suddenly. In this article we describe an opportunity enabled by a series of developments in materials, guided-wave optics and lithography. It centers on our emerging ability to fabricate centimeter-scale guided-wave photonic structures with nanometer-scale feature size, essentially perfect spatial coherence and entirely arbitrary structure. New applications in photonic transport and processing may emerge when the technique is applied to low index contrast materials in accordance with the basic principles of volume holography and photonic crystals.